Your IP: United States Near: Ann Arbor, Michigan, United States

Lookup IP Information

2 3 4 5 6 7 8 Next

Below is the list of all allocated IP address in - network range, sorted by latency.

Trichlorosilane IUPAC name trichlorosilane Other names silyl trichloride, silicochloroform Identifiers CAS number 10025-78-2 Y PubChem 24811 ChemSpider 23196 Y EC number 233-042-5 UN number 1295 RTECS number VV5950000 SMILES Cl[SiH](Cl)Cl InChI InChI=1S/Cl3HSi/c1-4(2)3/h4H Y Key: ZDHXKXAHOVTTAH-UHFFFAOYSA-N Y InChI=1/Cl3HSi/c1-4(2)3/h4H Key: ZDHXKXAHOVTTAH-UHFFFAOYAH Properties Molecular formula HCl3Si Molar mass 135.45 g·mol-1 Appearance colourless liquid Density 1.342 g/cm3 Melting point −126.6 °C Boiling point 31.8 °C Solubility in water hydrolysis Hazards MSDS ICSC 0591 EU Index 014-001-00-9 EU classification Highly flammable (F+) Harmful (Xn) Corrosive (C) R-phrases R12, R14, R17, R20/22, R29, R35 S-phrases (S2), S7/9, S16, S26, S36/37/39, S42, S45 NFPA 704 4 3 2 W Flash point −27 °C Autoignition temperature 185 °C Explosive limits 1.2–90.5% Related compounds Related chlorosilanes Chlorosilane Dichlorosilane Dichloromethylsilane Chlorodimethylsilane Silicon tetrachloride Related compounds Trifluorosilane Tribromosilane Chloroform  Y(what is this?)  (verify) Except where noted otherwise, data are given for materials in their standard state (at 25 °C, 100 kPa) Infobox references Trichlorosilane is a chemical compound containing silicon, hydrogen, and chlorine. At high temperatures, it decomposes to produce silicon, and therefore purified trichlorosilane is the principal source of ultrapure silicon in the semiconductor industry. In water, it rapidly decomposes to produce a silicone polymer while giving off hydrochloric acid. Because of its reactivity and wide availability, it is frequently used in the synthesis of silicon-containing organic compounds. Contents 1 Production 2 Application 3 References 4 External links Production Industrially, trichlorosilane is produced by blowing hydrogen chloride through a bed of silicon powder at 300°C. There, they combine to make trichlorosilane and hydrogen according to the chemical equation Si + 3 HCl → HSiCl3 + H2 A properly designed reactor can achieve a yield of 80-90% trichlorosilane. The major byproducts are silicon tetrachloride (chemical formula SiCl4), hexachlorodisilane (Si2Cl6), and dichlorosilane (H2SiCl2), from which trichlorosilane can be separated by distillation. The reverse process is used in the production of silicon of higher purity. Application Trichlorosilane is the basic ingredient used in the production of purified polysilicons. References Semiconductors: Silicon: Substrate Manufacture: Polycrystalline Silicon Production External links Polysilicon Plant in India.